Alternative Lithography: Unleashing the Potentials of by Clivia M. Sotomayor Torres (auth.), Clivia M. Sotomayor

By Clivia M. Sotomayor Torres (auth.), Clivia M. Sotomayor Torres (eds.)

Good previous Gutenberg couldn't have imagined that his innovative printing notion which so vastly contributed to dissemination of data and hence this present day 's wealth, might were a resource of notion years later. Now, it sort of feels intuitive uncomplicated strategy to produce loads of replicates is utilizing a mould to emboss trend you wish, yet on the nanoscale not anything is easy: the satan is within the element. And this booklet is ready the "devil". within the following 17 chapters, the authors-all of them good well-known and energetic actors during this rising field-describe the cutting-edge, at the present time 's technological bottlenecks and the customers for micro-contact printing and nanoimprint lithography. Many result of this e-book originate from initiatives funded by means of the eu Com­ venture via its "Nanotechnology details units" (NID) initiative. NID used to be introduced with the target to advance nanoscale units for the time while the pink­ brick state of affairs of the ITRS roadmap will be reached. It grew to become quickly transparent even though, that there has been no aspect to enquire simply substitute units to CMOS, yet what was once particularly wanted was once an built-in strategy that took under consideration extra features of this tough venture. Technologically conversing , this intended to have a coherent technique to improve novel units, nanofabrication instruments and circuit & procedure architectures on the related time.

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Sample text

On the other hand, for many application moulds are applied, which contain a variety of features differing in size by orders of magnitude. The largest transport distances on the mould define the minimum time, required to complete the filling of all mould cavities. Reduction of transport distances by intelligent mould design is possible within limits set by the functionality of the target device. Even for moulds containing only nano-sized features, a change in transport distances over various orders of magnitude usually takes place during embossing .

Such an understanding will certainly contribute to the definition of the potential and limitations of HEL. In this chapter, an attempt will be made to summarize those aspects ofpolymer flow properties, which are closely related to the embossing process . The discussion begins with the squeezing flow of a Newtonian liquid as the simplest approach, which can be adapted to HEL. Although the conclusions that can be drawn are rather qualitative, because the model is too simple to account properly for the flow properties of polymers and the complexity of the flow fields, some considerable insight into the flow process can be gained.

To adapt the squeezing flow model to the situation encountered in nanoimprinting, it is necessary to understand - at least qualitatively - the different contributions to the force, which arise from the pressure and the shear stress related to the fluid motion . The area of contact between the mould and the fluid determines the required force to obtain the pressure P-Pa. The contribution arising from the shear stress is related to the flow velocity, which depends on the transport distance s as defined by the mould design (Figure 5).

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